Our Company has now supplied forefront solutions for research and development in crystal production and microelectronics for more than 20 years. We cater to the needs of both, front-end-of-line (FEOL) and back-end-of-line (BEOL) portions of IC fabrication. In addition to our high technology portfolio, we are able to provide the technical infrastrastructure required for the instruments – water, compressed air, electricity, exhaust ducts and gas cabinets. Our main directions are:
CVD, PVD and Dry Etch Equipment (tools for reactive ion etching, ion-beam etching and deposition, atomic layer deposition, growing 2D structures, magnetron sputtering, evaporation);
Ion Implantation (Ion implanters for R&D and production, refurbished tools and contract manufacturing);
Electron Beam Lithography (High resolution EBL equipment).
