Ion Beam Tool
To address the worldwide market requirements for Ion Beam Milling and Deposition Systems, Scientific Vacuum Systems Ltd have formed a partnership with Ion Beam Scientific, suppliers of KRI range of DC and RF Ion sources. Both organisations combine many years of experience in Ion Beam and Deposition Systems process knowledge and systems design.Our Ion Beam Systems range from R&D through to medium and large scale batch production units, incorporating the latest Ion Source designs and technology.
Our standard range of ion beam systems along with further details on available features are listed below
R&D System with 10cm diameter Rotary Cooled Stage (4cm DC & RFICP source options)
Small Batch System with 15cm diameter Rotary Cooled Stage (4/8/10/12/14cm DC/RFICP source options)
Medium Batch System with 20cm diameter Rotary Cooled Stage or 8”x 4 or 8”x 3 Planetary (16cm DC & 20cm RFICP source options)
Large Batch Production System with 20cm x 6 Planetary Cooled Stage (30cm RFICP source)
The PlasmalabSystem400 provides the ability to sputter metals, oxides, nitrides and silicides with film thicknesses from 20 nm up to several μm.