Ion Beam Tool

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To address the worldwide market requirements for Ion Beam Milling and Deposition Systems, Scientific Vacuum Systems Ltd have formed a partnership with Ion Beam Scientific, suppliers of KRI range of DC and RF Ion sources. Both organisations combine many years of experience in Ion Beam and Deposition Systems process knowledge and systems design.Our Ion Beam Systems range from R&D through to medium and large scale batch production units, incorporating the latest Ion Source designs and technology.

Our standard range of ion beam systems along with further details on available features are listed below

ViB 400
R&D System with 10cm diameter Rotary Cooled Stage (4cm DC & RFICP source options)

ViB 1600
Small Batch System with 15cm diameter Rotary Cooled Stage (4/8/10/12/14cm DC/RFICP source options)

ViB 2000
Medium Batch System with 20cm diameter Rotary Cooled Stage or 8”x 4 or 8”x 3 Planetary (16cm DC & 20cm RFICP source options)

ViB 3000
Large Batch Production System with 20cm x 6 Planetary Cooled Stage (30cm RFICP source)

The PlasmalabSystem400
provides the ability to sputter metals, oxides, nitrides and silicides with film thicknesses from 20 nm up to several μm.

  • Flexibility in processes and materials is enabled by the wide temperature range of the wafer table, with both watercooling and heating up to 300 °C
  • rf bias allows plasma-assisted deposition for greater adhesion and control of film structure and stoichiometry

  • substrate heating
  • separate PreEtch module
  • Vacuum Cassette optional
  • cathodes from 75 mm to 200 mm diameter