ION-TOF
Today, ION-TOF GmbH is known for its innovative ion beam technology for surface analysis with different product lines in TOF-SIMS and LEIS.
TOF-SIMS and many of its applications have been pioneered by Prof. Benninghoven and his group in the early 80’s.
Two instrument generations for surface spectroscopy were developed at the University of Muenster. In 1989 ION-TOF started to commercialise the technique and has continued the development of TOF-SIMS instrumentation.
In 2007 ION-TOF expanded its product range to the complementary technique of high sensitivity low energy ion scattering (LEIS). Based on the pioneering research and instrument development carried out by Professor Brongersma and his group at the Eindhoven University of Technology, carried forward by Calipso BV, and their long term application experience, ION-TOF has developed the next generation of LEIS instruments.
Time-of-Flight secondary ion mass spectrometry (TOF-SIMS) is a very sensitive surface analytical technique, well established for many industrial and research applications. It provides detailed elemental and molecular information about the surface, thin layers, interfaces of the sample, and gives a full three-dimensional analysis.
The use is widespread, including semiconductors, polymers, paint, coatings, glass, paper, metals, ceramics, biomaterials, pharmaceuticals and organic tissue.
The significant advantages of low energy ion scattering (LEIS) are extreme surface sensitivity and quantification. Contrary to many other established surface analysis techniques such as XPS or AES, which generally integrate over several atomic layers, LEIS characterises individual atomic layers. These features make the Qtac100 an extremely valuable instrument when information about the composition of the first atomic layer is required.
Static depth profiling is used to analyse the sub-surface atomic layers and to determine layer thicknesses. The Qtac100 extends the range of LEIS applications to surface imaging and dynamic sputter depth profiling.
hr-MFM (High-resolution Magnetic Force Microscope) – key instrument for research and development of high-density magnetic media. 10 nm magnetic resolution guaranteed. PPMS®-AFM (Atomic Force Microscope) – first AFM with high-resolution MFM mode designed for the PPMS of Quantum Design. Less than 25 mm diameter.
