Ion Beam Etch & Deposition
Oxford Instruments offers a single tool, allowing
the flexibility to perform etch and/or deposition
and maximising system utilisation.
System specifications can be closely tuned to
applications, enabling faster and repeatable
process results. The Oxford Instruments Ion Beam
range offers functionality in multiple modes:
- Ion Beam Etching (IBE)
- Reactive Ion Beam Etching (RIBE)
- Chemical Assisted Ion Beam Etching (CAIBE)
- Ion Beam Sputter Deposition (IBSD)
- Ion Assisted Sputter Deposition (IASD)
Oxford Instruments’ systems are scalable from R&D
to batch production in one tool. Go to Technique ...
Optofab 3000
Specifically developed for high quality optical applications, including High Reflective and Anti Reflective Coatings, Optofab3000 is based on the proven architecture of the Ionfab300Plus – offering the same features and
benefits of the Ionfab300Plus with added capabilities.
IonFab 500Plus
Designed for ultra high quality optical thin films, the Ionfab500Plus was first supplied in 1983 and was the world’s first commercial ion beam sputter deposition system for ring laser gyroscope manufacture. In recent years customers have demonstrated mirrors exhibiting < 20ppm on a commercially available system using the Ionfab500Plus.
Ionfab 300Plus
Ionfab300Plus is a modular System designed for ion beam etching
and deposition. It is used in a wide variety of processes,
particularly in the Semiconductor and Optical Coating Industries