Nanoscale Growth
Oxford
Instruments offers a range of process solutions for nanostructure
growth, taking in carbon nanotubes (CNT), silicon and other material
nanowires, nanometre thin film deposition and III-V/II-VI/nitride
semicondonductor epitaxial growth.
Nanostructure growth solutions - Our range of "bottom-up" nanostructure growth solutions encompasses:
- Carbon nanotubes
- Plasma-enhanced chemical vapour deposition (PECVD) growth of carbon nanotubes (CNT) in our Nanofab tools
- Nanowires
- PECVD growth of a wide range of nanowire materials in our Nanofab tools
- Nanometre thin films
- Atomic layer deposition (ALD) for ultra-thin film deposition using our FlexAL and OpAL ALD tools, with highly conformal (~100%), pinhole-free coverage of a wide range of oxides, nitrides, single element metals and nanolaminates materials, with nanometre-level control of film thickness
- Epitaxial growth of III-V, II-VI and nitride materials
Nanoscale Si etching
For "top-down" nanostructure creation, nanometre scale features can be etched in silicon using our PlasmalabSystem100, PlasmalabSystem133 and Plasmalab80Plus plasma etch tools.
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Nanofab800Agile
The Nanofab800Agile delivers high performance growth of nanotubes and nanowires with in-situ catalyst activation and rigorous process control. Oxford Instruments offers flexible tools with proven processes
Nanofab700
The Nanofab700 delivers high performance growth of nanotubes and nanowires with in-situ catalyst activation and rigorous process control.